Nanostructured TiN Thin films suitable for medical applications

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Show simple item record Islam, Hedayetul en_US Berkahn, Mark en_US Cornell, Bruce en_US Valenzuela, Stella en_US Martin, Donald en_US Wuhrer, Ric en_US
dc.contributor.editor en_US 2010-05-28T09:49:30Z 2010-05-28T09:49:30Z 2008 en_US
dc.identifier 2008000793 en_US
dc.identifier.citation Islam Hedayetul et al. 2008, 'Nanostructured TiN Thin films suitable for medical applications', The Institute of Materials engineering Australasia Ltd, vol. 32, pp. 129-136. en_US
dc.identifier.issn 1447-6738 en_US
dc.identifier.other C1 en_US
dc.description.abstract Titanium nitride thin films are widely used in biomedical implants because of thier biocompatibility, good mechanical properties and high corrosion resistance. Titanium nitride (TiN) thin films on silicon and glass substrates were prepared using a dc megnetron sputtering system under condition of systematically varying the nitrogen pressure and titanium megnetron power. en_US
dc.language en_US
dc.publisher The Institute of Materials engineering Australasia Ltd en_US
dc.relation.isbasedon en_US
dc.title Nanostructured TiN Thin films suitable for medical applications en_US
dc.parent Materials forum en_US
dc.journal.volume 32 en_US
dc.journal.number en_US
dc.publocation Melbourne, Australia en_US
dc.identifier.startpage 129 en_US
dc.identifier.endpage 136 en_US SCI.Centre of Expertise Microstructural Analysis en_US
dc.conference Verified OK en_US
dc.for 100709 en_US
dc.personcode 998588 en_US
dc.personcode 880536 en_US
dc.personcode 970908 en_US
dc.personcode 0000041893 en_US
dc.personcode 010690 en_US
dc.personcode 960727 en_US
dc.percentage 100 en_US Nanomedicine en_US
dc.classification.type FOR-08 en_US
dc.edition en_US
dc.custom en_US en_US
dc.location.activity en_US
dc.description.keywords en_US
dc.staffid 960727 en_US

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