Nanocapacitive circuit elements

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dc.contributor.author Zareie, Hadi en_US
dc.contributor.author Morgan, Scott en_US
dc.contributor.author Moghaddam, Matthew en_US
dc.contributor.author Maaroof, Abbas en_US
dc.contributor.author Cortie, Michael en_US
dc.contributor.author Phillips, Matt en_US
dc.contributor.editor en_US
dc.date.accessioned 2010-05-28T09:47:54Z
dc.date.available 2010-05-28T09:47:54Z
dc.date.issued 2008 en_US
dc.identifier 2008000235 en_US
dc.identifier.citation Zareie Hadi et al. 2008, 'Nanocapacitive circuit elements', Amer Chemical Soc, vol. 2, no. 8, pp. 1615-1619. en_US
dc.identifier.issn 1936-0851 en_US
dc.identifier.other C1 en_US
dc.identifier.uri http://hdl.handle.net/10453/9166
dc.description.abstract Natural lithography was used to prepare arrays of nanoscale capacitors on silicon. The capacitance was verified by a novel technique based on the interaction of a charged substrate with the electron beam of a scanning electron microscope. The nanocapacit en_US
dc.language en_US
dc.publisher Amer Chemical Soc en_US
dc.relation.hasversion Accepted manuscript version en_US
dc.relation.isbasedon http://dx.doi.org/10.1021/nn800053x en_US
dc.rights This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://pubs.acs.org/page/policy/articlesonrequest/index.html en_US
dc.title Nanocapacitive circuit elements en_US
dc.parent ACS Nano en_US
dc.journal.volume 2 en_US
dc.journal.number 8 en_US
dc.publocation Washington en_US
dc.identifier.startpage 1615 en_US
dc.identifier.endpage 1619 en_US
dc.cauo.name SCI.Faculty Research Institutes en_US
dc.conference Verified OK en_US
dc.for 091200 en_US
dc.personcode 030414 en_US
dc.personcode 96088947 en_US
dc.personcode 94106349 en_US
dc.personcode 010727 en_US
dc.personcode 020302 en_US
dc.personcode 810070 en_US
dc.percentage 100 en_US
dc.classification.name Materials Engineering en_US
dc.classification.type FOR-08 en_US
dc.edition en_US
dc.custom en_US
dc.date.activity en_US
dc.location.activity ISI:000258775000014 en_US
dc.description.keywords Electron-Irradiated Insulators; Natural Lithography; Optical-Properties; Fabrication; Films; Spectroscopy; Bombardment; Microscope; Surfaces; Nanocaps en_US
dc.staffid en_US
dc.staffid 810070 en_US


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