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| dc.contributor.author | Zareie Hadi | en_US |
| dc.contributor.author | Morgan Scott | en_US |
| dc.contributor.author | Moghaddam Matthew | en_US |
| dc.contributor.author | Maaroof Abbas | en_US |
| dc.contributor.author | Cortie Michael | en_US |
| dc.contributor.author | Phillips Matthew | en_US |
| dc.contributor.editor | en_US | |
| dc.date.accessioned | 2010-05-28T09:47:54Z | |
| dc.date.available | 2010-05-28T09:47:54Z | |
| dc.date.issued | 2008 | en_US |
| dc.identifier | 2008000235 | en_US |
| dc.identifier.citation | Zareie Hadi et al. 2008, 'Nanocapacitive circuit elements', Amer Chemical Soc, vol. 2, no. 8, pp. 1615-1619. | en_US |
| dc.identifier.issn | 1936-0851 | en_US |
| dc.identifier.other | C1 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10453/9166 | |
| dc.description.abstract | Natural lithography was used to prepare arrays of nanoscale capacitors on silicon. The capacitance was verified by a novel technique based on the interaction of a charged substrate with the electron beam of a scanning electron microscope. The nanocapacit | en_US |
| dc.language | en_US | |
| dc.publisher | Amer Chemical Soc | en_US |
| dc.relation.hasversion | Accepted manuscript version | en_US |
| dc.relation.isbasedon | http://dx.doi.org/10.1021/nn800053x | en_US |
| dc.rights | This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Nano, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see http://pubs.acs.org/page/policy/articlesonrequest/index.html | en_US |
| dc.title | Nanocapacitive circuit elements | en_US |
| dc.parent | ACS Nano | en_US |
| dc.journal.volume | 2 | en_US |
| dc.journal.number | 8 | en_US |
| dc.publocation | Washington | en_US |
| dc.identifier.startpage | 1615 | en_US |
| dc.identifier.endpage | 1619 | en_US |
| dc.cauo.name | SCI.Faculty Research Institutes | en_US |
| dc.conference | Verified OK | en_US |
| dc.for | 091200 | en_US |
| dc.personcode | 010727;020302;030414;810070;94106349;040207 | en_US |
| dc.percentage | 000100 | en_US |
| dc.classification.name | Materials Engineering | en_US |
| dc.classification.type | FOR-08 | en_US |
| dc.edition | en_US | |
| dc.custom | en_US | |
| dc.date.activity | en_US | |
| dc.location.activity | ISI:000258775000014 | en_US |
| dc.description.keywords | Electron-Irradiated Insulators; Natural Lithography; Optical-Properties; Fabrication; Films; Spectroscopy; Bombardment; Microscope; Surfaces; Nanocaps | en_US |
| dc.staffid | en_US |
