XPS and AFM surface studies of solvent-cast PS/PMMA blends

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dc.contributor.author Ton-That, Cuong en_US
dc.contributor.author Shard, Alex en_US
dc.contributor.author Teare, D. en_US
dc.contributor.author Bradley, R. en_US
dc.contributor.editor en_US
dc.date.accessioned 2010-05-28T09:42:39Z
dc.date.available 2010-05-28T09:42:39Z
dc.date.issued 2001 en_US
dc.identifier 2006006447 en_US
dc.identifier.citation Ton-That Cuong et al. 2001, 'XPS and AFM surface studies of solvent-cast PS/PMMA blends', Elsevier Ltd, vol. 42, no. 3, pp. 1121-1129. en_US
dc.identifier.issn 0032-3861 en_US
dc.identifier.other C1UNSUBMIT en_US
dc.identifier.uri http://hdl.handle.net/10453/8346
dc.description.abstract Films of polystyrene (PS) and poly(methyl methacrylate) (PMMA) blends of two different thicknesses have been examined by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Blends with different compositions were spin-cast onto a mica substrate with chloroform as the mutual solvent. XPS measurements revealed surface enrichment of PMMA in all compositions. The thicker (66 nm) films exhibit a higher degree of PMMA surface enrichment than the thinner (17 nm) films. AFM imaging allows distinctions to be drawn between blends with differing compositions. The blend films with less than 50% PMMA bulk concentration generally exhibit pitted surfaces; the pit size varies with film thickness and bulk composition. When the PMMA bulk concentration is greater than 50%, the film surface changes to show island-like phase-separated structure. The surface segregation and morphology are explained in terms of solubilities of the two polymers in the solvent and dewetting of PMMA relative to PS. The phase domains on the film surface have also been resolved by frictional force microscopy (FFM) using hydrophilic tips bearing hydroxyl groups. en_US
dc.language en_US
dc.publisher Elsevier Ltd en_US
dc.relation.isbasedon http://dx.doi.org/10.1016/S0032-3861(00)00448-1 en_US
dc.title XPS and AFM surface studies of solvent-cast PS/PMMA blends en_US
dc.parent Polymer en_US
dc.journal.volume 42 en_US
dc.journal.number 3 en_US
dc.publocation Amsterdam, Netherlands en_US
dc.identifier.startpage 1121 en_US
dc.identifier.endpage 1129 en_US
dc.cauo.name SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 020400 en_US
dc.personcode 031010 en_US
dc.personcode 0000024616 en_US
dc.personcode 0000030140 en_US
dc.personcode 0000030141 en_US
dc.percentage 80 en_US
dc.classification.name Condensed Matter Physics en_US
dc.classification.type FOR-08 en_US
dc.edition en_US
dc.custom en_US
dc.date.activity en_US
dc.location.activity en_US
dc.description.keywords Polymer blends; XPS; AFM en_US


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