Direct nanoengineering and lithographic patterning of optically anisotropic thin films
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| dc.contributor.author | Hodgkinson Ian | en_US |
| dc.contributor.author | Wu Qi | en_US |
| dc.contributor.author | Arnold Matthew | en_US |
| dc.contributor.author | Blaikie Richard | en_US |
| dc.contributor.editor | en_US | |
| dc.date.accessioned | 2010-05-28T09:42:37Z | |
| dc.date.available | 2010-05-28T09:42:37Z | |
| dc.date.issued | 2001 | en_US |
| dc.identifier | 2006006647 | en_US |
| dc.identifier.citation | Hodgkinson Ian et al. 2001, 'Direct nanoengineering and lithographic patterning of optically anisotropic thin films', Elsevier, vol. 57-58, pp. 833-836. | en_US |
| dc.identifier.issn | 01679317 | en_US |
| dc.identifier.other | C1 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10453/8342 | |
| dc.description.abstract | Biaxial and chiral thin films formed by oblique vapour deposition are patterned using standard photolithography. In one example 5 ?m wide half-wave plates are fabricated by reactive ion etching a biaxial silicon film. | en_US |
| dc.language | en_US | |
| dc.publisher | Elsevier | en_US |
| dc.relation.isbasedon | http://dx.doi.org/10.1016/S0167-9317(01)00440-3 | en_US |
| dc.title | Direct nanoengineering and lithographic patterning of optically anisotropic thin films | en_US |
| dc.parent | Microelectronic Engineering | en_US |
| dc.journal.volume | 57-58 | en_US |
| dc.journal.number | en_US | |
| dc.publocation | Amsterdam, The Netherlands | en_US |
| dc.identifier.startpage | 833 | en_US |
| dc.identifier.endpage | 836 | en_US |
| dc.cauo.name | SCI.Physics and Advanced Materials | en_US |
| dc.conference | Verified OK | en_US |
| dc.for | 020504 | en_US |
| dc.personcode | 0000030327;0000030325;0000030326;999147 | en_US |
| dc.percentage | 000100 | en_US |
| dc.classification.name | Photonics, Optoelectronics and Optical Communications | en_US |
| dc.classification.type | FOR-08 | en_US |
| dc.edition | en_US | |
| dc.custom | en_US | |
| dc.date.activity | en_US | |
| dc.location.activity | en_US | |
| dc.description.keywords | Birefringence; Chiral film; Lithography; Reactive ion etching; Thin film | en_US |
| dc.staffid | University of Canterbury;University of Otago | en_US |
