X-ray mapping and post processing

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dc.contributor.author Wuhrer, Richard en_US
dc.contributor.author Moran, Ken en_US
dc.contributor.author Phillips, Matthew en_US
dc.contributor.editor Kotula P, Marko M, Scott JH, Gauvin R, Beniac D, Lucas G, McKernan S, Shields J en_US
dc.date.accessioned 2009-06-26T04:12:57Z
dc.date.available 2009-06-26T04:12:57Z
dc.date.issued 2006 en_US
dc.identifier 2006005777 en_US
dc.identifier.citation Wuhrer Richard, Moran Ken, and Phillips Matthew 2006, 'X-ray mapping and post processing', Cambridge university Press, USA, pp. 1404-1405. en_US
dc.identifier.issn 1431-9276 en_US
dc.identifier.other E1 en_US
dc.identifier.uri http://hdl.handle.net/10453/756
dc.description.abstract Characterisation of materials frequently involves the determination of variation in composition, structure and microstructure, by the use of a variety of imaging and analysis techniques. There is an increasing need to understand materials phenomena and processes and to learn more about exploiting subtle changes in the distribution of elements in materials technology. Scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), wavelength dispersive spectroscopy (WDS) and the combination of these techniques through x-ray mapping (XRM) has become an excellent tool for characterising the distribution of elements and phases in materials. This analytical technique provides a high magnification image related to the distribution and relative abundance of elements within a given specimen and thus makes XRM particularly useful for: ? identifying the location of individual elements and ? mapping the spatial distribution of specific elements and phases within a sample (material surface). en_US
dc.publisher Cambridge university Press en_US
dc.relation.isbasedon http://dx.doi.org/10.1017/S1431927606062428 en_US
dc.title X-ray mapping and post processing en_US
dc.parent Proceedings of Microscopy & Microanalysis 12 Suppl. 2, 2006 en_US
dc.publocation USA en_US
dc.identifier.startpage 1404 en_US
dc.identifier.endpage 1405 en_US
dc.cauo.name SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 100700 en_US
dc.personcode 880536 en_US
dc.personcode 0000022654 en_US
dc.personcode 810070 en_US
dc.percentage 100 en_US
dc.classification.name Materials Engineering en_US
dc.classification.type FOR-08 en_US
dc.custom Microscopy & Microanalysis en_US
dc.date.activity 20060730 en_US
dc.location.activity Chicago USA en_US
dc.staffid 810070 en_US


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