The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors

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Show simple item record Solina, Danica en_US Cheary, Robert en_US Swift, Paul en_US Mccredie, Geoff en_US 2009-06-26T04:10:29Z 2009-06-26T04:10:29Z 2003 en_US
dc.identifier 2003000503 en_US
dc.identifier.citation Solina Danica et al. 2003, 'The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors', Elsevier Science Sa, vol. 423, no. 1, pp. 1-12. en_US
dc.identifier.issn 0040-6090 en_US
dc.identifier.other C1 en_US
dc.description.abstract An investigation has been carried out to determine the conditions required for the fabrication of stable SiO2?Pt multilayers using DC-magnetron sputtering for the Pt and RF-magnetron sputtering for the SiO2. As a preliminary investigation, single layers of Pt on SiO2 were analysed by X-ray reflectivity (XRR) and X-ray photoelectron spectroscopy (XPS) to develop a model of the Pt?SiO2 interface layer. The results indicated that a distinct interface layer develops as a Pt silicate approximately 6 ? thick. SiO2?Pt multilayers fabricated with a period d>65 ? using pure argon as the sputtering gas, display X-ray reflectivity patterns which can be accurately characterised by a repeating bilayer model. When d<65 ? the multilayer becomes unstable upon exposure to air. Additional peaks develop in the XRR pattern which increase in magnitude with time. These peaks arise from the expansion of the SiO2 layers in the multilayer starting from the top bilayer and gradually working through the multilayer. In the as-prepared specimens the SiO2 layers are incompletely oxidised and have a composition SiOx (x<2) and, on exposure to air, oxygen diffuses through the multilayer surface converting the SiOx to SiO2. By introducing a small partial pressure of oxygen into the sputtering gas during deposition, multilayers with d<65 ? remained stable on exposure to air. Under these conditions the density of the platinum layers determined from XRR measurements was reduced by approximately 25%. XPS showed that the platinum layer contained bonded oxygen in the form of platinum oxide PtOx (x<1). SiO2/PtOx multilayers have been fabricated with periods down to 13 ?, but the intensity of the first order peak drops off dramatically once the thickness of the PtOx layer is less that 10?12 ?. en_US
dc.publisher Elsevier Science Sa en_US
dc.relation.isbasedon en_US
dc.title The fabrication of stable platinum-silicon oxide multilayers for X-ray mirrors en_US
dc.parent Thin Solid Films en_US
dc.journal.volume 423 en_US
dc.journal.number 1 en_US
dc.publocation Lausanne, Switzerland en_US
dc.identifier.startpage 1 en_US
dc.identifier.endpage 12 en_US SCI.Physics and Advanced Materials en_US
dc.conference Verified OK en_US
dc.for 020400 en_US
dc.personcode 101110 en_US
dc.personcode 723559 en_US
dc.personcode 900566 en_US
dc.personcode 820131 en_US
dc.percentage 100 en_US Condensed Matter Physics en_US
dc.classification.type FOR-08 en_US
dc.description.keywords multilayers, platinum, X-ray photoelectron spectroscopy, X-ray total reflection analysisThin-films; Dioxide Films; Reflectivity; Surfaces; Optics; Oxygen; Spectroscopy; Performance; Stability; Layers en_US
dc.staffid 820131 en_US

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