A study on the dry cleaning of aluminium surfaces by low temperature plasma process

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dc.contributor.author Lim, G. en_US
dc.contributor.author Kim, K.H en_US
dc.contributor.author Li, H.J en_US
dc.contributor.author Song, S en_US
dc.contributor.author Shon, Hokyong en_US
dc.contributor.author Cho, D en_US
dc.contributor.editor en_US
dc.date.accessioned 2010-06-16T04:58:15Z
dc.date.available 2010-06-16T04:58:15Z
dc.date.issued 2008 en_US
dc.identifier 2008005644 en_US
dc.identifier.citation Lim G. et al. 2008, 'A study on the dry cleaning of aluminium surfaces by low temperature plasma process', Elsevier, vol. 19, no. 6, pp. 640-644. en_US
dc.identifier.issn 1225-0112 en_US
dc.identifier.other C1UNSUBMIT en_US
dc.identifier.uri http://hdl.handle.net/10453/11812
dc.description.abstract Lubricating oil on aluminium surfaces was cleaned by a low temperature plasma process. Oxygen plasma mixed with argon was used, and process parameters were the mixing ratio of argon in oxygen, discharge power, and negative DC potential. The aluminium surfaces were analyzed with FTIR and EDX after the cleaning. It was found that almost all of the oil was eliminated in 20 min. if the oil was pure. Elimination efficiency was highly dependent on operational conditions of the process. The highest efficiency was obtained when treated at 300 W with oxygen plasma mixed with 30% argon applying negative potential more than -500 V on the aluminium surfaces. However, efficiency higher that 60% cannot be obtained at any condition if the oil contained inorganic materials. en_US
dc.language en_US
dc.publisher Elsevier en_US
dc.title A study on the dry cleaning of aluminium surfaces by low temperature plasma process en_US
dc.parent Journal of the Korean Industrial and Engineering Chemistry en_US
dc.journal.volume 19 en_US
dc.journal.number 6 en_US
dc.publocation Netherlands en_US
dc.identifier.startpage 640 en_US
dc.identifier.endpage 644 en_US
dc.cauo.name FEIT.School of Elec, Mech and Mechatronic Systems en_US
dc.conference Verified OK en_US
dc.for 090407 en_US
dc.personcode 0000050742 en_US
dc.personcode 0000050743 en_US
dc.personcode 0000050744 en_US
dc.personcode 0000050745 en_US
dc.personcode 0000050746 en_US
dc.personcode 995130 en_US
dc.personcode 0000050483 en_US
dc.percentage 34 en_US
dc.classification.name Process Control and Simulation en_US
dc.classification.type FOR-08 en_US
dc.edition en_US
dc.custom en_US
dc.date.activity en_US
dc.location.activity en_US
dc.description.keywords low temperature plasma, elimination efficiency, discharge power, negative DC potential en_US


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